0-45° UVFS High Energy Laser Line Mirror
Tuniu high‑power laser line mirrors cover standard working wavelengths of 1064 nm and dual‑wavelength 532&1064 nm. Manufactured on high‑purity UV‑grade fused silica substrates and coated with dielectric films featuring an ultra‑high laser‑induced damage threshold (LIDT), these mirrors deliver exceptional damage resistance and reliably handle high‑energy laser pulses.
They are ideally suited for high‑power applications including laser micromachining and laser material processing. Supporting 0°–45° incident angles, these mirrors achieve reflectivity greater than 99% at the target wavelength. Back polishing and back sanding configurations are available upon request.
Tuniu offers high‑precision mirrors with a variety of substrate materials, as well as full customization for non‑standard dimensions and coating specifications. For custom solutions, please contact us.
Parameters
| Optical material | UV fused quartz | Diameter | 12.7/25.4 mm |
| Thickness | 6 mm | Coating | Laser induced damage threshold (LIDT) dielectric film |
| Incident angle (AOI) | 0°-45° | Surface parallelism | < 3 arcmin |
| Backside processing | Sanding/polishing | ||
Model
Wavelengths: 532 & 1064 nm, 1064 nm
Eg. UVFS High Energy Laser Line Mirror, Round, Ø25.4 mm, 532 nm and 1064 nm
| Luminous aperture | > 85% CA | Design wavelength | 532 & 1064 nm |
| Reflectivity | Rs, Rp > 99%@532&1064 nm | Incident angle (AOI) | 0-45° |
| Damage threshold | 8 J/cm², 532 nm, 10 ns, 20 Hz; 30 J/cm², 1064 nm, 10 ns, 20 Hz | Thickness tolerance | ± 0.25 mm |
| Diameter tolerance | + 0.0/-0.1 mm | Surface flatness (@ 633 nm) | λ/10 |
| Surface smoothness (scratches/pitting) | 40/20 | Backside processing | Frosting |